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Formation of size-controlled silicon nanocrystals in plasma enhanced chemical vapor deposition grown SiOxNy/SiO2 superlattices

✍ Scribed by A.M. Hartel; D. Hiller; S. Gutsch; P. Löper; S. Estradé; F. Peiró; B. Garrido; M. Zacharias

Book ID: 113937131
Publisher: Elsevier Science
Year: 2011
Tongue: English
Weight: 550 KB
Volume: 520
Category: Article
ISSN: 0040-6090
DOI: 10.1016/j.tsf.2011.06.084

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