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Effect of impinging ion energy on the substrates during deposition of SiOx films by radiofrequency plasma enhanced chemical vapor deposition process

✍ Scribed by A.J. Choudhury; S.A. Barve; Joyanti Chutia; H. Kakati; A.R. Pal; Jagannath; N. Mithal; R. Kishore; M. Pandey; D.S. Patil

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Critical ion energy and ion flux in the

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Polysilicon Films Prepared by Plasma Enh

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Effect of Gas Sources on the Deposition

✍ Weng, Jun; Xiong, Liwei; Wang, Jianhua; Man, Weidong; Chen, Guanhu 📂 Article 📅 2010 🏛 IOP Publishing 🌐 English ⚖ 210 KB

Synthesis of diamond-like carbon films o

✍ Meng Yang; Shuichi Ogawa; Susumu Takabayashi; Taiichi Otsuji; Yuji Takakuwa 📂 Article 📅 2012 🏛 Elsevier Science 🌐 English ⚖ 703 KB