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Ion bombardment of amorphous silicon films during plasma-enhanced chemical vapor deposition in an rf discharge

✍ Scribed by A. S. Abramov; A. Ya. Vinogradov; A. I. Kosarev; M. V. Shutov; A. S. Smirnov; K. E. Orlov

Book ID
110120840
Publisher
Springer
Year
1998
Tongue
English
Weight
325 KB
Volume
43
Category
Article
ISSN
1063-7842

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