✦ LIBER ✦
Suppression of hydrogen-ion drift into underlying layers using plasma deposited silicon oxynitride film during high-density plasma chemical vapor deposition
✍ Scribed by T. Murata; T. Yamaguchi; M. Sawada; S. Shimizu; K. Asai; K. Kobayashi; H. Miyatake; M. Yoneda
- Book ID
- 108289496
- Publisher
- Elsevier Science
- Year
- 2007
- Tongue
- English
- Weight
- 548 KB
- Volume
- 515
- Category
- Article
- ISSN
- 0040-6090
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