Optical emission spectroscopy as a process control tool during plasma enhanced chemical vapor deposition of microcrystalline silicon thin films

✍ Scribed by C.C. Du; T.C. Wei; C.H. Chang; S.L. Lee; M.W. Liang; J.R. Huang; C.H. Wu; A. Shirakura; R. Morisawa; T. Suzuki

• Book ID: 113937253
• Publisher: Elsevier Science
• Year: 2012
• Tongue: English
• Weight: 644 KB
• Volume: 520
• Category: Article
• ISSN: 0040-6090
• DOI: 10.1016/j.tsf.2011.08.110