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Process control by optical emission spectroscopy during growth of a-C: H from a CH4 plasma by plasma-enhanced chemical vapour deposition

✍ Scribed by C. Barholm-Hansen; M.D. Bentzon; M.E. Vigild; E. Findeisen; R. Feidenhans'l; J. Bindslev Hansen

No coin nor oath required. For personal study only.

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