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Correlations between process parameters, chemical structure and electronic properties of amorphous hydrogenated GexC1−x films prepared by plasma-enhanced chemical vapour deposition in a three-electrode reactor

✍ Scribed by J. Tyczkowski; P. Kazimierski; H. Szymanowski


Publisher
Elsevier Science
Year
1994
Tongue
English
Weight
342 KB
Volume
241
Category
Article
ISSN
0040-6090

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