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Amorphous silicon and amorphous silicon nitride films prepared by a plasma-enhanced chemical vapor deposition process as optical coating materials

✍ Scribed by Tsai, Rung-Ywan ;Kuo, Lee-Chin ;Ho, Fang Chuan

Book ID
115343008
Publisher
The Optical Society
Year
1993
Tongue
English
Weight
618 KB
Volume
32
Category
Article
ISSN
1559-128X

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