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Direct formation of crystalline silicon films on an amorphous substrate from chlorinated materials by plasma-enhanced chemical vapor deposition

✍ Scribed by Hajime Shirai; Sughoan Jung; Yukihiro Fujimura; Yasutake Toyoshima

Book ID: 117145650
Publisher: Elsevier Science
Year: 2002
Tongue: English
Weight: 511 KB
Volume: 299-302
Category: Article
ISSN: 0022-3093
DOI: 10.1016/s0022-3093(01)01188-7

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