Disorder-induced nucleation in the nanocrystalline silicon film growth from chlorinated materials by rf plasma-enhanced chemical vapor deposition

✍ Scribed by Hajime Shirai; Tetsuji Ito; Yoshie Ikeda

• Book ID: 116667678
• Publisher: Elsevier Science
• Year: 2004
• Tongue: English
• Weight: 327 KB
• Volume: 338-340
• Category: Article
• ISSN: 0022-3093
• DOI: 10.1016/j.jnoncrysol.2004.02.033