๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Characterization of a-SiGe: H films prepared by rf glow discharge

โœ Scribed by Debajyoti Das; S.C. De; Swati Ray; A.K. Barua


Book ID
115988180
Publisher
Elsevier Science
Year
1991
Tongue
English
Weight
730 KB
Volume
128
Category
Article
ISSN
0022-3093

No coin nor oath required. For personal study only.


๐Ÿ“œ SIMILAR VOLUMES


High-photosensitivity a-SiGe: H films pr
โœ Fangqing Zhang; Zhizhong Song; Yongping Guo; Guanghua Chen ๐Ÿ“‚ Article ๐Ÿ“… 1993 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 247 KB

Highly photosensitive and narrow band gap a-SiGe:H films have been prepared by the RF glow discharge plasma CVD method. The photosensitivity was 2.01 ร— 10 s for the film with an optical band gap of Eg = 1.47 eV. H 2 dilution and a relatively high RF power are attributed to the improving of the optoe