High-photosensitivity a-SiGe: H films pr
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Fangqing Zhang; Zhizhong Song; Yongping Guo; Guanghua Chen
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Article
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1993
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Elsevier Science
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English
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Highly photosensitive and narrow band gap a-SiGe:H films have been prepared by the RF glow discharge plasma CVD method. The photosensitivity was 2.01 ร 10 s for the film with an optical band gap of Eg = 1.47 eV. H 2 dilution and a relatively high RF power are attributed to the improving of the optoe