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Preparation of photoconductive a-SiGe alloy by glow discharge

โœ Scribed by Kazuhiko Nozawa; Yoshinori Yamaguchi; Jun-ichi Hanna; Isamu Shimizu

Book ID
118332415
Publisher
Elsevier Science
Year
1983
Tongue
English
Weight
167 KB
Volume
59-60
Category
Article
ISSN
0022-3093

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๐Ÿ“œ SIMILAR VOLUMES

High-photosensitivity a-SiGe: H films pr
High-photosensitivity a-SiGe: H films prepared by RF glow discharge plasma CVD method
โœ Fangqing Zhang; Zhizhong Song; Yongping Guo; Guanghua Chen ๐Ÿ“‚ Article ๐Ÿ“… 1993 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 247 KB

Highly photosensitive and narrow band gap a-SiGe:H films have been prepared by the RF glow discharge plasma CVD method. The photosensitivity was 2.01 ร— 10 s for the film with an optical band gap of Eg = 1.47 eV. H 2 dilution and a relatively high RF power are attributed to the improving of the optoe