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Intrinsic Hydrogenated Microcrystalline Silicon Oxide Films Prepared by RF Glow Discharge

โœ Scribed by D. Das; S. Mandal; A. K. Barua

Book ID
110239679
Publisher
Springer
Year
1998
Tongue
English
Weight
97 KB
Volume
17
Category
Article
ISSN
0261-8028

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## Abstract Recent model calculations are studied of Ance et al. concerning the valence electron density and hydrogen concentration in hydrogenated amorphous silicon films prepared by glow discharge decomposition of silane. This study is essentially necessitated by the fact that the model of Ance e