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Wide optical-gap a-SiO:H films prepared by rf glow discharge

โœ Scribed by Debajyoti Das; S.M Iftiquar; A.K Barua


Book ID
117148098
Publisher
Elsevier Science
Year
1997
Tongue
English
Weight
195 KB
Volume
210
Category
Article
ISSN
0022-3093

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Highly photosensitive and narrow band gap a-SiGe:H films have been prepared by the RF glow discharge plasma CVD method. The photosensitivity was 2.01 ร— 10 s for the film with an optical band gap of Eg = 1.47 eV. H 2 dilution and a relatively high RF power are attributed to the improving of the optoe