Wide optical-gap a-SiO:H films prepared by rf glow discharge
โ Scribed by Debajyoti Das; S.M Iftiquar; A.K Barua
- Book ID
- 117148098
- Publisher
- Elsevier Science
- Year
- 1997
- Tongue
- English
- Weight
- 195 KB
- Volume
- 210
- Category
- Article
- ISSN
- 0022-3093
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Highly photosensitive and narrow band gap a-SiGe:H films have been prepared by the RF glow discharge plasma CVD method. The photosensitivity was 2.01 ร 10 s for the film with an optical band gap of Eg = 1.47 eV. H 2 dilution and a relatively high RF power are attributed to the improving of the optoe