Characteristics of germanium dry etching using inductively coupled SF6 plasma

✍ Scribed by K-H. Shim; Y-H. Kil; H.D. Yang; B.K. Park; J-H. Yang; S. Kang; T.S. Jeong; Taek Sung Kim

• Book ID: 116760491
• Publisher: Elsevier Science
• Year: 2012
• Tongue: English
• Weight: 635 KB
• Volume: 15
• Category: Article
• ISSN: 1369-8001
• DOI: 10.1016/j.mssp.2011.12.002