Boron mediation on the growth of Ge quantum dots on Si (1 0 0) by ultra high vacuum chemical vapor deposition system
β Scribed by P.S. Chen; Z. Pei; Y.H. Peng; S.W. Lee; M.-J. Tsai
- Publisher
- Elsevier Science
- Year
- 2004
- Tongue
- English
- Weight
- 382 KB
- Volume
- 108
- Category
- Article
- ISSN
- 0921-5107
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The formation of III-V InAs quantum dots (QDs) on group-IV Si 1-x Ge x /Si(0 0 1) was investigated by metalorganic vapor-phase epitaxy. Two types of QDs, round-shaped QDs and giant QDs elongated in the [1 1 0] or [1,-1,0] direction, were observed in a growth condition of low V/III ratios. An increas
The incorporation of substitutional carbon (C sub ) in low-temperature epitaxial Si 1ΓxΓy Ge x C y thin films using SiH 4 , GeH 4 and C 2 H 4 by ultra-high-vacuum chemical vapor deposition was investigated in this work. The Si 1ΓxΓy Ge x C y alloys have been grown at a temperature range from 550 to