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Atomistic origin of high-quality “novel SiON gate dielectrics”

✍ Scribed by Keita Yamaguchi; Akira Otake; Kenji Kobayashi; Kenji Shiraishi


Book ID
104052359
Publisher
Elsevier Science
Year
2009
Tongue
English
Weight
673 KB
Volume
86
Category
Article
ISSN
0167-9317

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A comparison between the Channel Hot-Carrier (CHC) degradation on strained pMOSFETs with SiGe source/ drain (S/D) based on different gate dielectric materials, as SiON or HfSiON, has been done. The influence of the device channel orientation, channel length and temperature on the CHC damage has been