Low-Temperature Formation of High-Quality Interlayer for High- Gate Dielectrics/Ge by Electron-Cyclotron-Resonance Plasma Techniques

✍ Scribed by Fukuda, Y.; Yazaki, Y.; Otani, Y.; Sato, T.; Toyota, H.; Ono, T.

• Book ID: 114619856
• Publisher: IEEE
• Year: 2010
• Tongue: English
• Weight: 519 KB
• Volume: 57
• Category: Article
• ISSN: 0018-9383
• DOI: 10.1109/ted.2009.2035030