Structural and electrical properties of Zr oxide film for high-kgate dielectrics by using electron cyclotron resonance plasma sputtering

✍ Scribed by J. Wang; L. Zhao; N. H.Luu; D. Wang; H. Nakashima

• Publisher: Springer
• Year: 2004
• Tongue: English
• Weight: 713 KB
• Volume: 80
• Category: Article
• ISSN: 1432-0630
• DOI: 10.1007/s00339-003-2483-z