𝔖 Bobbio Scriptorium
✦   LIBER   ✦

A simple approach to fabrication of high-quality HfSiON gate dielectrics with improved nMOSFET performances

✍ Scribed by Xuguang Wang; Jun Liu; Feng Zhu; Yamada, N.; Dim-Lee Kwong


Book ID
114617589
Publisher
IEEE
Year
2004
Tongue
English
Weight
829 KB
Volume
51
Category
Article
ISSN
0018-9383

No coin nor oath required. For personal study only.