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Atomic layer deposition of tin oxide films using tetrakis(dimethylamino) tin

✍ Scribed by Elam, Jeffrey W.; Baker, David A.; Hryn, Alexander J.; Martinson, Alex B. F.; Pellin, Michael J.; Hupp, Joseph T.

Book ID: 127319639
Publisher: AVS (American Vacuum Society)
Year: 2008
Tongue: English
Weight: 830 KB
Volume: 26
Category: Article
ISSN: 0734-2101
DOI: 10.1116/1.2835087

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