✦ LIBER ✦
Investigation of Thermal Stability of TiN Film Formed by Atomic Layer Deposition Using Tetrakis(dimethylamino)titanium Precursor for Metal-Gate Metal–Oxide–Semiconductor Field-Effect Transistor
✍ Scribed by Hayashida, Tetsuro; Endo, Kazuhiko; Liu, Yongxun; Kamei, Takahiro; Matsukawa, Takashi; O'uchi, Shin-ichi; Sakamoto, Kunihiro; Tsukada, Junichi; Ishikawa, Yuki; Yamauchi, Hiromi; Ogura, Atsushi; Masahara, Meishoku
- Book ID
- 120333330
- Publisher
- Institute of Pure and Applied Physics
- Year
- 2010
- Tongue
- English
- Weight
- 383 KB
- Volume
- 49
- Category
- Article
- ISSN
- 0021-4922
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