𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Atomic Layer Deposition of Tin Monosulfide Thin Films

✍ Scribed by Prasert Sinsermsuksakul; Jaeyeong Heo; Wontae Noh; Adam S. Hock; Roy G. Gordon


Publisher
John Wiley and Sons
Year
2011
Tongue
English
Weight
688 KB
Volume
1
Category
Article
ISSN
1614-6832

No coin nor oath required. For personal study only.


πŸ“œ SIMILAR VOLUMES


Biocompatibility of atomic layer-deposit
✍ Dudley S. Finch; Tammy Oreskovic; Krishna Ramadurai; Cari F. Herrmann; Steven M. πŸ“‚ Article πŸ“… 2008 πŸ› John Wiley and Sons 🌐 English βš– 256 KB πŸ‘ 1 views

## Abstract Presented in this paper is a study of the biocompatibility of an atomic layer‐deposited (ALD) alumina (Al~2~O~3~) thin film and an ALD hydrophobic coating on standard glass cover slips. The pure ALD alumina coating exhibited a water contact angle of 55Β° Β± 5Β° attributed, in part, to a hi

Atomic Layer Deposition of Ruthenium Thi
✍ Hongtao Wang; Roy G. Gordon; Roger Alvis; Robert M. Ulfig πŸ“‚ Article πŸ“… 2009 πŸ› John Wiley and Sons 🌐 English βš– 846 KB

## Abstract Ruthenium thin films are deposited by atomic layer deposition (ALD) from bis(__N__,__N__'‐di‐__tert__‐butylacetamidinato)ruthenium(II) dicarbonyl and O~2~. Highly conductive, dense, and pure thin films can be deposited when oxygen exposure, __E__~O~, approaches a certain threshold (__E_