𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Atomic Layer Deposition of Ta2O5/Polyimide Nanolaminates

✍ Scribed by Leo D. Salmi; Esa Puukilainen; Marko Vehkamäki; Mikko Heikkilä; Mikko Ritala

Publisher
John Wiley and Sons
Year
2009
Tongue
English
Weight
389 KB
Volume
15
Category
Article
ISSN
0948-1907

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Atomic Layer Deposition of Ta2O5 Using t
Atomic Layer Deposition of Ta2O5 Using the TaI5 and O2 Precursor Combination
✍ J. Sundqvist; H. Högberg; A. Hårsta 📂 Article 📅 2003 🏛 John Wiley and Sons 🌐 English ⚖ 231 KB 👁 1 views

## Abstract Thin films of tantalum oxide have been deposited on Si(100) substrates using atomic layer deposition (ALD) employing the TaI~5~ and O~2~ precursor combination. Growth was studied in the temperature region 400 to 700 °C. The resulting films were found to be iodine‐free above 450 °C, and

Atomic Layer Deposition of Gadolinium Ox
Atomic Layer Deposition of Gadolinium Oxide Films
✍ K. Kukli; T. Hatanpää; M. Ritala; M. Leskelä 📂 Article 📅 2007 🏛 John Wiley and Sons 🌐 English ⚖ 320 KB

Thin cubic Gd 2 O 3 films are grown by atomic layer deposition (ALD), in the temperature range 300-400 °C, using a novel tris(2,3-dimethyl-2-butoxy)gadolinium(III) precursor, Gd[OC(CH 3 ) 2 CH(CH 3 ) 2 ] 3 , and water. The films are crystalline in their as-deposited state. The films contain some res