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Atomic layer deposition of aluminum oxide films on graphene

✍ Scribed by Rammula, Raul; Aarik, Lauri; Kasikov, Arne; Kozlova, Jekaterina; Kahro, Tauno; Matisen, Leonard; Niilisk, Ahti; Alles, Harry; Aarik, Jaan

Book ID
126305971
Publisher
IOP Publishing
Year
2013
Weight
606 KB
Volume
49
Category
Article
ISSN
1757-8981

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Thin cubic Gd 2 O 3 films are grown by atomic layer deposition (ALD), in the temperature range 300-400 Β°C, using a novel tris(2,3-dimethyl-2-butoxy)gadolinium(III) precursor, Gd[OC(CH 3 ) 2 CH(CH 3 ) 2 ] 3 , and water. The films are crystalline in their as-deposited state. The films contain some res