𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Molecular Mechanisms of Aluminum Oxide Thin Film Growth on Polystyrene during Atomic Layer Deposition

✍ Scribed by Manjunath Puttaswamy; Kenneth Brian Haugshøj; Dr. Leif Højslet Christensen; Prof. Dr. Peter Kingshott

Publisher
John Wiley and Sons
Year
2010
Tongue
English
Weight
681 KB
Volume
16
Category
Article
ISSN
0947-6539

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Growth of the Initial Atomic Layers of T
Growth of the Initial Atomic Layers of Ta-N Films During Atomic Layer Deposition on Silicon-Based Substrates
✍ Steffen Strehle; Daniela Schmidt; Matthias Albert; Johann W. Bartha 📂 Article 📅 2011 🏛 John Wiley and Sons 🌐 English ⚖ 651 KB

## Abstract The growth of ultra‐thin Ta‐N films using atomic layer deposition (ALD) is investigated by in‐situ X‐ray photoelectron spectroscopy (XPS) starting from the first precursor pulse, as precursor substances __tert__‐butylimido‐tris(diethylamido)tantalum (TBTDET) and __tert__‐butylimido‐bis(

Mass Analysis of Growth of Al2O3 Thin Fi
Mass Analysis of Growth of Al2O3 Thin Films from Low-Temperature Atomic Layer Deposition on Woven Cotton
✍ Daisuke Hojo; Tadafumi Adschiri 📂 Article 📅 2010 🏛 John Wiley and Sons 🌐 English ⚖ 368 KB 👁 1 views

## Abstract Atomic layer deposition (ALD) at 100 °C provides a conformal coating on woven cotton with a tortuous and complex surfaces. The woven structures are completely preserved and replicated with thin coating of Al~2~O~3~, even after removing the cotton templates. The replicated woven structur