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Atomic layer controlled deposition of Al2O3 films using binary reaction sequence chemistry

✍ Scribed by A.W. Ott; K.C. McCarley; J.W. Klaus; J.D. Way; S.M. George

Book ID
108418316
Publisher
Elsevier Science
Year
1996
Tongue
English
Weight
779 KB
Volume
107
Category
Article
ISSN
0169-4332

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