Al O and SiO were deposited on BN particles with atomic layer control using alternating exposures of Al CH rH O 2 3 2 3 3 2 and SiCl rH O, respectively. The sequential surface chemistry was monitored in vacuum using transmission Fourier 4 2 Ž . transform infrared FTIR spectroscopy studies on high su
✦ LIBER ✦
Atomic layer controlled deposition of SiO2 and Al2O3 using ABAB… binary reaction sequence chemistry
✍ Scribed by S.M. George; O. Sneh; A.C. Dillon; M.L. Wise; A.W. Ott; L.A. Okada; J.D. Way
- Publisher
- Elsevier Science
- Year
- 1994
- Tongue
- English
- Weight
- 742 KB
- Volume
- 82-83
- Category
- Article
- ISSN
- 0169-4332
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