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Atomic Layer Deposition of Gadolinium Aluminate using Gd(iPrCp)3, TMA, and O3 or H2O

✍ Scribed by Christoph Adelmann; Dieter Pierreux; Johan Swerts; Daan Dewulf; An Hardy; Hilde Tielens; Alexis Franquet; Bert Brijs; Alain Moussa; Thierry Conard; Marlies K. Van Bael; Jan W. Maes; Malgorzata Jurczak; Jorge A. Kittl; Sven Van Elshocht


Publisher
John Wiley and Sons
Year
2010
Tongue
English
Weight
587 KB
Volume
16
Category
Article
ISSN
0948-1907

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πŸ“œ SIMILAR VOLUMES


Atomic layer deposition of Al2O3 and SiO
✍ J.D Ferguson; A.W Weimer; S.M George πŸ“‚ Article πŸ“… 2000 πŸ› Elsevier Science 🌐 English βš– 764 KB

Al O and SiO were deposited on BN particles with atomic layer control using alternating exposures of Al CH rH O 2 3 2 3 3 2 and SiCl rH O, respectively. The sequential surface chemistry was monitored in vacuum using transmission Fourier 4 2 Ε½ . transform infrared FTIR spectroscopy studies on high su