A1203-films deposited by atomic layer epitaxy onto silicon wafers were investigated structurally and electrically. A post-deposition anneal at 900ยฐC resulted in a decrease in film thickness of about 10% and an increase in the index of refraction of about 3%. The densification did not significantly i
Electronic structure and optical properties of Nb doped Al2O3 on Si by atomic layer deposition
โ Scribed by Yan Xu; Lin Chen; Qing-Qing Sun; Jing-Jing Gu; Hong-Liang Lu; Peng-Fei Wang; Shi-Jin Ding; David Wei Zhang
- Publisher
- Elsevier Science
- Year
- 2010
- Tongue
- English
- Weight
- 607 KB
- Volume
- 150
- Category
- Article
- ISSN
- 0038-1098
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โฆ Synopsis
A. Nb 2 O 5 and Al 2 O 3 B. Atomic layer deposition C. Optical properties D. Electronic structure a b s t r a c t Nb 2 O 5 and Nb doped Al 2 O 3 have proved to be good candidates as resistive switch materials or optical materials.
In this letter, we focus on the complex electronic structure and optical properties of Nb doped Al 2 O 3 to give chemical physical images of the films. With the help of SE, XPS and XPS valence band spectra, the detailed electronic structure with atomic bonding structure and optical properties are given. The band gap of a thin oxide film is determined to be 5.05 eV, and the evolution of VBO and CBO of the film on Si are also discussed.
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