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Electronic structure and optical properties of Nb doped Al2O3 on Si by atomic layer deposition

โœ Scribed by Yan Xu; Lin Chen; Qing-Qing Sun; Jing-Jing Gu; Hong-Liang Lu; Peng-Fei Wang; Shi-Jin Ding; David Wei Zhang


Publisher
Elsevier Science
Year
2010
Tongue
English
Weight
607 KB
Volume
150
Category
Article
ISSN
0038-1098

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โœฆ Synopsis


A. Nb 2 O 5 and Al 2 O 3 B. Atomic layer deposition C. Optical properties D. Electronic structure a b s t r a c t Nb 2 O 5 and Nb doped Al 2 O 3 have proved to be good candidates as resistive switch materials or optical materials.

In this letter, we focus on the complex electronic structure and optical properties of Nb doped Al 2 O 3 to give chemical physical images of the films. With the help of SE, XPS and XPS valence band spectra, the detailed electronic structure with atomic bonding structure and optical properties are given. The band gap of a thin oxide film is determined to be 5.05 eV, and the evolution of VBO and CBO of the film on Si are also discussed.


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