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Characterization of SiO2 Deposited by CVD on MoxOy/Al2O3 using NMR and TOF-SIMS

✍ Scribed by K. A. Boateng; J. M. Hill

Publisher: John Wiley and Sons
Year: 2008
Tongue: English
Weight: 591 KB
Volume: 14
Category: Article
ISSN: 0948-1907
DOI: 10.1002/cvde.200706642

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