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Application of deep reactive ion etching for silicon angular rate sensor

✍ Scribed by J. Choi; K. Minami; M. Esashi

Publisher: Springer-Verlag
Year: 1996
Tongue: English
Weight: 803 KB
Volume: 2
Category: Article
ISSN: 0946-7076
DOI: 10.1007/s005420050042

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