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Analysis of electronic memory traps in the oxide-nitride-oxide structure of a polysilicon-oxide-nitride-oxide-semiconductor flash memory

✍ Scribed by Seo, Y. J.; Kim, K. C.; Kim, T. G.; Sung, Y. M.; Cho, H. Y.; Joo, M. S.; Pyi, S. H.


Book ID
121331135
Publisher
American Institute of Physics
Year
2008
Tongue
English
Weight
634 KB
Volume
92
Category
Article
ISSN
0003-6951

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Aggressive scaling of Flash memory devices requires robust tunnel oxides to improve the cell performance while preserving the retention and endurance characteristics. In this context, reoxidation of the tunnel oxide has recently [2] been proposed as a promising technique. In this paper, we focus our