Aluminium nitride films prepared by reactive magnetron sputtering
β Scribed by Muhl, S; Zapien, J A; Mendez, J M; Andrade, E
- Book ID
- 118176643
- Publisher
- Institute of Physics
- Year
- 1997
- Tongue
- English
- Weight
- 203 KB
- Volume
- 30
- Category
- Article
- ISSN
- 0022-3727
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AlN-films prepared by dc reactive magnetron sputtering. AlN in an Ar+N 2 gas mixture have been prepared and their microstructure, hardness, refractive index and IR transmittance examined. At l = 640 nm the refractive index was 1.93 and k = 3Γ10 -3 ; high transmission occurred between [??] structure
Polycrystalline Zn 3 N 2 films are prepared on Si and quartz glass substrates by RF magnetron sputtering at room temperature. The structural and optical properties are studied by X-ray diffraction and double beam spectrophotometer, respectively. X-ray diffraction indicates that the Zn 3 N 2 films de