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AES and SIMS profiling of buried silicide layers formed by 6 MeV high dose nickel implantation into silicon

✍ Scribed by A. Schönborn; J. K. N. Lindner; E. H. Kaat; H. Hubert; M. Grasserbauer; G. Friedbacher


Book ID
112376615
Publisher
Springer
Year
1989
Tongue
English
Weight
397 KB
Volume
333
Category
Article
ISSN
1618-2650

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