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Advances in high rate sputtering with magnetron-plasmatron processing and instrumentation

✍ Scribed by S. Schiller; U. Heisig; K. Goedicke; K. Schade; G. Teschner; J. Henneberger

Book ID
103421592
Publisher
Elsevier Science
Year
1979
Tongue
English
Weight
828 KB
Volume
64
Category
Article
ISSN
0040-6090

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Process stabilization and enhancement of
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Reactive high power pulsed magnetron sputtering (HPPMS) of zirconium oxide exhibits a stable and hysteresis-free transition zone, as opposed to reactive direct current magnetron sputtering (dcMS). The stabilization of the transition zone in HPPMS facilitates the growth of transparent zirconium oxide