✦ LIBER ✦
5090. Reactive dc high-rate sputtering with the magnetron/plasmatron for industrial applications: S Schiller et al Vakuum Technik, 30 (1), 1981, 3–15
- Publisher
- Elsevier Science
- Year
- 1982
- Tongue
- English
- Weight
- 140 KB
- Volume
- 32
- Category
- Article
- ISSN
- 0042-207X
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