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Aspects and results of long-term stable deposition of Al2O3 with high rate pulsed reactive magnetron sputtering

✍ Scribed by P. Frach; U. Heisig; Chr. Gottfried; H. Walde

Book ID: 107930253
Publisher: Elsevier Science
Year: 1993
Tongue: English
Weight: 503 KB
Volume: 59
Category: Article
ISSN: 0257-8972
DOI: 10.1016/0257-8972(93)90079-4

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