✦ LIBER ✦

Advances in excimer laser technology for sub-0.25-μm lithography

✍ Scribed by Das, P.; Sandstrom, R.L.

Book ID: 118694536
Publisher: IEEE
Year: 2002
Tongue: English
Weight: 625 KB
Volume: 90
Category: Article
ISSN: 0018-9219
DOI: 10.1109/jproc.2002.803665

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Excimer lasers for 0.1 μm lithography an

Excimer lasers for 0.1 μm lithography and beyond

✍ K. Vogler; U. Stamm; R. Pätzel; I. Tassy; I. Bragin; R. Osmanov; S. Govorkov; J. 📂 Article 📅 2000 🏛 Elsevier Science 🌐 English ⚖ 289 KB

According to thc SIA roadmap, semiconductor chip geometries will reach feature sizes of 100 nm in the year 2002. In this process the exposure wavelength for the optical lithography is proposed to be 193 nm and ultimately 157 nm, as emitted by the ArF respectively the F2 excimer laser. During the pas

CD control using SiON BARL processing fo

CD control using SiON BARL processing for sub-0.25 μm lithography

✍ F. Zhang; M. Op de Beeck; M. Schaekers; K. Ronse; W. Conley; P. Gopalan; H. Gang 📂 Article 📅 1999 🏛 Elsevier Science 🌐 English ⚖ 342 KB

A methodology for deep sub-0.25 μm CMOS

A methodology for deep sub-0.25 μm CMOS technology prediction

✍ Palankovski, V.; Belova, N.; Grasser, T.; Puchner, H.; Aronowitz, S.; Selberherr 📂 Article 📅 2001 🏛 IEEE 🌐 English ⚖ 147 KB

Manufacturable DUV lithography processes

Manufacturable DUV lithography processes for 0.25μm technology contact and via layers

✍ Daniel Baker; Maaike Op de Beeck; Harry Botermans; Luc Van den hove 📂 Article 📅 1997 🏛 Elsevier Science 🌐 English ⚖ 414 KB

Fabrication of high performance 512Kb SR

Fabrication of high performance 512Kb SRAMs in 0.25 μm CMOS technology using x-ray lithography

✍ R. Viswanathan; D. Seeger; A. Bright; T. Bucelot; A. Pomerene; K. Petrillo; P. B 📂 Article 📅 1994 🏛 Elsevier Science 🌐 English ⚖ 485 KB

Sub-0.25-μm ion projection lithography (

Sub-0.25-μm ion projection lithography (IPL) in PMMA- and novolak-based resist materials (RAY-PF, RAY-PN, SAL-603)

✍ E. Cekan; W. Fallmann; W. Friza; F. Paschke; G. Stangl; P. Hudek; E. Bayer; H. K 📂 Article 📅 1992 🏛 Elsevier Science 🌐 English ⚖ 483 KB