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CD control using SiON BARL processing for sub-0.25 μm lithography

✍ Scribed by F. Zhang; M. Op de Beeck; M. Schaekers; K. Ronse; W. Conley; P. Gopalan; H. Gangala; M. Dusa; J. Bendik

Publisher: Elsevier Science
Year: 1999
Tongue: English
Weight: 342 KB
Volume: 46
Category: Article
ISSN: 0167-9317
DOI: 10.1016/s0167-9317(99)00013-1

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