✦ LIBER ✦

A methodology for deep sub-0.25 μm CMOS technology prediction

✍ Scribed by Palankovski, V.; Belova, N.; Grasser, T.; Puchner, H.; Aronowitz, S.; Selberherr, S.

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

A high-performance 0.25-μm CMOS technolo

✍ Davari, B.; Chang, W.H.; Petrillo, K.E.; Wong, C.Y.; Moy, D.; Taur, Y.; Wordeman 📂 Article 📅 1992 🏛 IEEE 🌐 English ⚖ 1022 KB

Shallow P+-junction technology for 0.25

✍ H. Pomp; P.H. Woerlee; A.J. Walker 📂 Article 📅 1992 🏛 Elsevier Science 🌐 English ⚖ 230 KB

Device characterisation of a high-perfor

✍ P.H. Woerlee; C.A.H. Juffermans; H. Lifka; W.H. Manders; H.G. Pomp; G.M. Paulzen 📂 Article 📅 1992 🏛 Elsevier Science 🌐 English ⚖ 218 KB

Advances in excimer laser technology for

✍ Das, P.; Sandstrom, R.L. 📂 Article 📅 2002 🏛 IEEE 🌐 English ⚖ 625 KB

The investigation of key technologies fo

✍ Qiuxia Xu; He Qian; Huaxiang Yin; Lin Jia; Honghao Ji; Baoqing Chen; Yajiang Zhu 📂 Article 📅 2001 🏛 IEEE 🌐 English ⚖ 227 KB

A high-performance 0.25-μm CMOS technolo

✍ Chang, W.-H.; Davari, B.; Wordeman, M.R.; Taur, Y.; Hsu, C.C.-H.; Rodriguez, M.D 📂 Article 📅 1992 🏛 IEEE 🌐 English ⚖ 746 KB