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Fabrication of high performance 512Kb SRAMs in 0.25 μm CMOS technology using x-ray lithography

✍ Scribed by R. Viswanathan; D. Seeger; A. Bright; T. Bucelot; A. Pomerene; K. Petrillo; P. Blauner; P. Agnello; J. Warlaumont; J. Conway; D. Patel

Publisher: Elsevier Science
Year: 1994
Tongue: English
Weight: 485 KB
Volume: 23
Category: Article
ISSN: 0167-9317
DOI: 10.1016/0167-9317(94)90148-1

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