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A Stagnant Layer Model for the Epitaxial Growth of Silicon from Silane in a Horizontal Reactor

โœ Scribed by Eversteyn, F. C.; Severin, P. J. W.; v. d. Brekel, C. H. J.; Peek, H. L.


Book ID
115509605
Publisher
The Electrochemical Society
Year
1970
Tongue
English
Weight
738 KB
Volume
117
Category
Article
ISSN
0013-4651

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