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a-Si:H deposited at high rate on the cathode of a rf-PECVD reactor

✍ Scribed by Stephan Will; Helmut Mell; Margarethe Poschenrieder; Walther Fuhs

Book ID: 117149036
Publisher: Elsevier Science
Year: 1998
Tongue: English
Weight: 105 KB
Volume: 227-230
Category: Article
ISSN: 0022-3093
DOI: 10.1016/s0022-3093(98)00328-7

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