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Annealing effect on structure and properties of a-Si:H prepared at high deposition-rate

✍ Scribed by Masato Ueda; Akiyoshi Chayahara; Toshio Nakashita; Takeshi Imura; Yukio Osaka


Book ID
118333506
Publisher
Elsevier Science
Year
1985
Tongue
English
Weight
155 KB
Volume
77-78
Category
Article
ISSN
0022-3093

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