𝔖 Bobbio Scriptorium
✦   LIBER   ✦

DEPENDENCE OF THE OPTICAL AND ELECTRICAL PROPERTIES OF CHEMICALLY ANNEALED VACUUM-DEPOSITED a-Si:H FILMS ON THE DEPOSITION RATE

✍ Scribed by EL-NAGGAR, AHMED M.

Book ID
119951893
Publisher
World Scientific Publishing Company
Year
2012
Tongue
English
Weight
262 KB
Volume
27
Category
Article
ISSN
0217-9849

No coin nor oath required. For personal study only.

πŸ“œ SIMILAR VOLUMES

Influence of thickness on the optical pr
Influence of thickness on the optical properties of vacuum-deposited a-Si:H films
✍ A.M. El-Naggar πŸ“‚ Article πŸ“… 2001 πŸ› Elsevier Science 🌐 English βš– 110 KB

The in uence of the thickness of the a-Si : H ΓΏlm on its optical properties was studied using spectrophotometric measurements of the ΓΏlm transmittance and re ectance in the wavelength range 200 -3000 nm. Both the refractive index and the absorption coe cient were found to increase as the ΓΏlm thickne

Annealing effects on electrical and opti
Annealing effects on electrical and optical properties of ZnO films deposited on GaAs by metal organic chemical vapor deposition
✍ Jingchang Sun; Hongwei Liang; Jianze Zhao; Qiuju Feng; Jiming Bian; Ziwen Zhao; πŸ“‚ Article πŸ“… 2008 πŸ› Elsevier Science 🌐 English βš– 575 KB

## 2. Experimental procedures ZnO film was deposited on the SI-GaAs (100) substrate by MOCVD. Diethylzinc (DEZn) and O 2 were chosen as precursor of Zn and O, respectively, and high purity Ar was used as the carrying gas for DEZn. The mol flux ratio of Zn to O was kept at 1:250. The