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Annealing effects on electrical and optical properties of ZnO films deposited on GaAs by metal organic chemical vapor deposition

✍ Scribed by Jingchang Sun; Hongwei Liang; Jianze Zhao; Qiuju Feng; Jiming Bian; Ziwen Zhao; Heqiu Zhang; Yingmin Luo; Lizhong Hu; Guotong Du


Publisher
Elsevier Science
Year
2008
Tongue
English
Weight
575 KB
Volume
254
Category
Article
ISSN
0169-4332

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✦ Synopsis


2. Experimental procedures

ZnO film was deposited on the SI-GaAs (100) substrate by MOCVD. Diethylzinc (DEZn) and O 2 were chosen as precursor of Zn and O, respectively, and high purity Ar was used as the carrying gas for DEZn. The mol flux ratio of Zn to O was kept at 1:250. The


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