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A PVD based barrier technology for the 45 nm node

✍ Scribed by J. Forster; P. Gopalraja; T.J. Gung; A. Sundarrajan; X. Fu; N. Hammond; J. Fu; U. Kelkar; A. Bhatnagar

No coin nor oath required. For personal study only.

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A PVD based barrier technology for the 45&#xa0;nm node