Advanced lithography models for strict process control in the 32 nm technology node

✍ Scribed by G.P. Patsis; D. Drygiannakis; I. Raptis; E. Gogolides; A. Erdmann

• Publisher: Elsevier Science
• Year: 2009
• Tongue: English
• Weight: 551 KB
• Volume: 86
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/j.mee.2009.01.050