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Advanced front-end processes for the 45 nm CMOS technology node

✍ Scribed by E.J.H. Collart; S.B. Felch; H. Graoui; D. Kirkwood; S. Tallavarjula; J.A. Van den Berg; J. Hamilton; N.E.B. Cowern; K.J. Kirkby

Book ID: 108215093
Publisher: Elsevier Science
Year: 2004
Tongue: English
Weight: 459 KB
Volume: 114-115
Category: Article
ISSN: 0921-5107
DOI: 10.1016/j.mseb.2004.07.018

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